Elementary gas‐phase reactions of radical species during chemical vapor deposition of silicon carbide using CH3SiCl3

Added 328 days ago (12.01.2021)
Authors: Noboru Sato, Yuichi Funato, Kohei Shima, Hidetoshi Sugiura, Yasuyuki Fukushima, Takeshi Momose, Mitsuo Koshi, Yukihiro Shimogaki
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